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| 國內研討會論文 | 國內專利 | |
| "感應耦合電漿(ICP)深矽蝕刻技術”,林郁欣、徐永裕、劉祥麒、郭文凱、周正三,第七屆微系統科技協會年會暨微機電研討會論文集,p172~175,2001。 | ||
| “微光學元件品質評鑑(樣品使用DVD讀取頭)”,林宇仁、 李克怡、 張榮森、台灣光電技術研討會,Optics and Photonics Taiwan,2002。 | ||
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"高階貝索光束繞射元件設計與擴束 於紅外與可見光之特性研 究",傅同龍,台灣光電技術研討會,Optics and Photonics Taiwan,2002。 |
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| “深矽蝕刻之可動微結構感應耦合電漿離子蝕刻”,林郁欣、殷宏林、徐永裕、胡一君、楊宗勳、周曉宇,第六屆奈米 工程暨微系統研討會, 2002。 | ||
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“繞射式光束整型元件之設計”,林宇仁、傅同龍、林暉雄、周曉宇,第六屆奈米工程暨微系統研討會, 2002。 |
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“單一檢測系統量測電場及磁場”,謝坤尉、翁俊仁、傅同龍、黃暉舜、楊宗勳、周曉宇,台灣光電技術研討會,Optics and Photonics Taiwan,2002。 |
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“同時量測電場及磁場的檢測系統”,謝坤尉、翁俊仁、黃暉舜、傅同龍、楊宗勳、 周曉宇,第六屆奈米工程暨微系統研討會, 2002。 |
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| “雙穩態微型光開關之設計及製作”,殷宏林、林郁欣、徐永裕、胡一君、楊宗勳、周曉宇,第六屆奈米工程暨微系統研討會, 2002。 | ||
| “玻璃基材微流道之熱壓成型製程“,游智勝、楊宗勳、胡一君、周曉宇,第六屆奈米工程暨微系統研討會, 2002。 | ||
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"高階貝索光束繞射元件設計與擴束之特性研究",傅同龍,第六屆奈米工程暨微系統研討會, 2002。 |
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| "討論純量繞射理論用於設計光束整型之次波長繞射元件之可行性",傅同龍,2003 台灣光電科技研討會。 | ||
| “微光學元件應用於微生醫檢測系統之研究” ,林宇仁、游智勝、林暉雄、傅同龍、胡一君、周曉宇,2003 台灣光電科技研討會。 | ||
| “微型化螢光檢測系統之開發”,翁俊仁、謝哲偉、游智勝、顏宏霖、傅同龍、林明瑜、胡一君、周曉宇,2003台灣光電科技研討會。 | ||
| “應用於微光開關之SU-8 厚膜光阻微結構與致動器之研製”,楊啟榮、楊智仲、趙俊傑、林郁欣,第二十屆機械工程研討會論文集,2003。 | ||
| “A novel method of enhance the resolution limit of e-beam lithography lift off process to sub-100nm by re-exposing,”Shao-Chang Cheng, Yu-Hsin Lin, Hung-Ling Yin, Yi-Chiuen Hu, Hsiao-Yu Chou, , The 7th Nano Engineering and Micro System Technology Workshop, Taipei, Taiwan, 2003。 | ||
| ”Spontaneous Moving Phenomenon of Droplets,”Chih-Sheng Yu, Jia-Hui Chen, Yi-Chiuen Hu,Jing-Tang Yang, Hsiao-Yu Chou, Chen-Chien Jen,Proceedings of The 7th Nano Engineering and Micro System Technology Workshop, Taipei, Taiwan, 2003。 | ||
| “Characterization of Micro Cylindrical Lens Made of SU-8 Negative Photoresist,” J. Hsieh, C.-J. Weng, T.-L. Fu, Y. C. Hu, and H.-Y. Chou, Proceedings of The 7th Nano Engineering and Micro System Technology Workshop, Taipei, Taiwan, 2003。 | ||
| “Rapid Fabrication of Nano-Pillar Arrays Using Electron Beam Lithography in SU-8 , ”Hung-Lin Yin, Chih-Sheng Yu, Chia-Hui Chen, Yi-Chiuen Hu, Hsiao-Yu Chou, Proceedings of The 7th Nano Engineering and Micro System Technology Workshop, Taipei, Taiwan, 2003。 | ||
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“Fabrication of Fresnel Lens Using Electron Beam Gray-scale Lithography for Miniaturized Fluorescence Detection System,”Hung-Lin Yin, Yu-Jen Lin, Chih-Sheng Yu, Chi-Sheng Huang, Shao-Chang Cheng, Yi-Chiuen Hu, Hsiao-Yu Chou, Proceedings of The 7th Nano Engineering and Micro System Technology Workshop, Taipei, Taiwan, 2003。 |
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| “Nano scale high aspect ratio silicon molds for PDMS low cost and batch production,”Yu-Hsin Lin, Hung-Lin Yin, Shao-Chang Cheng, Yung-Yu Hsu, | ||
| Yi-Chiuen Hu, Hsiao-Yu Chou, Proceedings of The 7th Nano Engineering and Micro System Technology Workshop, Taipei, Taiwan, 2003。 | ||
| “Electric Field Induced Nanolithography with Application of Scanning Probe Microscopy,” Chien Ying Su, Jyh Shin Chen, Hung Ling Yin, Yu Hsuan Lin, Ming Hua Shiao, Chien Nan Hsiao, Yi Chiuen Hu, Hsiao Yu Chou, Chien Jen Chen, 2003 International Symposium on Nanoscience and Technology (2003)。 | ||
| “Nanolithography of Polymer Resist with the Application of Scanning Probe Technology,” Chien-Ying Su, Jyh-Shin Chen, Hung-Ling Yin, Yi-Chiuen Hu, Ming-Hua Shiao, Hsiao-Yu Chou, Chien-Nan Hsiao, SNDT(2004)。 | ||
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“Surface plasmon polariton nano-optical device fabrication by focused ion beam,“ Shao-Chang Cheng, Tong-Long Fu, Yu-Hsuan Lin, Yi-Chiuen Hu, Hui-Hsiung Lin, Hsiao-Yu Chou, Jyh-Shin Chen。 |
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| “Probing the optical fields of the surface plasmon polariton nano-structure,”Yu-Hsuan Lin, Shao-Chang Cheng, Tong-Long Fu, Chien Ying Su, Hui-Hsiung Lin, Yi-Jen Hu, H. Y. Chou, Jyh-Shin Chen。 | ||
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“Joint time-frequency spectrometer,” Technical Journal of Digital Signal Processing, 1, 2-19 (2000), S.-H. Tseng,T.-L. Fu,T.-W. Lu, and J.-L. Chern |
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“SCREAM for Multi-Level Movable Structures by Inductively Coupled Plasma Process,”Yu-Hsin Lin*, Hung-Ling Yin, Yung-Yu Hsu, Yi-Chiuen. Hu, Hsiao-Yu Chou, Tsung-Hsun Yang, ASME IMCE2002-33382, 2002 |
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“Super hydrophobic nanoscale surface texture for bio-droplet control,”Chih Sheng Yu, Yi Chiuen Hu, Hung Ling Yin, Hsiao Yu Chou, Jyh Shin Chen, and Chien Jen Chen, , AIAA Nano Science/Technology Conference, 2003 |
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“The Study on SU-8 Micro Cylindrical Lens for Laser Induced Fluorescence Application,”J. Hsieh, C.-J. Weng, H.-H. Lin, H.-L. Yin, Y. C. Hu, H.-Y. Chou, C.-F. Lai, and W. Fang, 2003/8, IEEE/LEOS International Conference on Optical MEMS, Waikoloa, HI, Aug 2003, Paper TuP 7. |
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“Toward An Improved Micro Spectrometer by Integrating Micro Cylindrical Lens and Tunable Vertical Grating,” J. Hsieh, K-W. Shieh, H-L. Yin, C-J. Weng, Y-H. Lin and H-Y. Chou, 2004/7, submitted to Asia-Pacific Conference of Transducers and Micro-Nano Technology (APCOT MNT2004). |
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“Electric Field Induced Nanoscale Patterning by Non-Contact Atomic Force Microscopy,” Chien Ying Su, Jyh Shin Chen, Hung Ling Yin, Yu Hsin Lin, Jiann Shiun Kao, Yi Chiuen Hu, Hsiao Yu Chou, Chien Jen Chen, U.S. Air Force/ Taiwan Nanoscience Initiative Workshop (2004). |
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“以電光量測系統量磁場即以磁光量測系統量電場的方法”,謝坤尉,科儀新知, pp. 44- pp. 51, no. 1, vol. 24, 2002. |
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“SI-LIGA製程技術與應用”,林郁欣、游智勝、胡一君,電子月刊, p114-121, 第90期2003年1月號。 |
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“微系統製程技術發展 (Development of Micro System Fabrication Technology)”,林郁欣、胡一君、周曉宇、科儀新知,第25券,第4期,中華民國九十三年二月。 |
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“電子束微影技術及其在奈米科技上之應用”,殷宏林、鄭紹章、林郁欣、胡一君、周曉宇、科儀新知135期。 |
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| “微型化螢光檢測系統,” ,謝哲偉、翁俊仁、林明瑜, 科儀新知 第25卷 第2期, 83-94頁, 民國九十二年十月。 | ||
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“掃描探針顯微術於奈米尺度微影之應用”,蘇健穎、周曉宇、陳至信,物理雙月刊,25-3.(2003) |
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“Novel Wavelength Filters with Reciprocal MMI Structures,” Keh-Yi Lee, Kenji Huang, Yu-Jen Lin ,Journal of Optical communication Novel Design for All-Optical Logic Gates with MMI Journal of Optical communication |
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“Realization and Characterization of SU-8 Micro Cylindrical Lenses for In-plane Micro Optical Systems,”J. Hsieh, C.-J. Weng, H.-L. Yin, H.-H. Lin, and H.-Y. Chou, 2004 to be printed in Microsystem technologies Journal. (SCI) |
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“Application 3D glycerol-compensated inclined-exposure technology to integrated optical pick-up head,”Kuo-Yung Hung1, Heng-Tsang Hu2 and Fan-Gang Tseng1 |
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| “以電光量測系統量測磁場及以磁光量測系統量測磁場的方法”, 謝坤尉, 中華民國專利, 申請案號091117506, | ||
| “晶片型微流道之製作方法”,游智勝, 楊宗勳, 胡一君, 周曉宇,,專利證號:189738 | ||
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“Method for Mesauring Magnetic Field based on Electro-ptic Probing Technique and Measuring Electric Field based on Magnetic Probing Technique” , Kuen-Wey Shieh (謝坤尉) , USA patent, application no. 20030173960, |
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