Chemical Vapor Deposition Vacuum Chamber
Introduction
The concepts and the requirements of this instrument is proposed by the commissioning organization, and the whole system is designed and manufactured by ITRC. The function of this instrument is that with high polymer materials spread on the surface of the substrate made of Al2O3, the carbon atoms decomposed from macromolecules are coated on the substrate at 800 degrees Celsius and in 100 Torr ambient pressure, with nitrogen flow rate at 100 sccm. The chamber designed as twin walls is cooled down by a recycling water cooling system. The key point of this system is the welding of the chamber and the design of the heating components. For further information, please call and discuss your specific application with us.
Technology
- CAD/CAM
- Chamber welding
- High temperature heating device
Specification
- Dimensions: φ 200 mm, 350 mm (H)
- Maximum temperature: 850 °C
- Vacuum level: 10−3 Torr
Application
- Chemical vapor deposition
- Thermal grown carbon nano tube
