Multi-Target Co-Sputtering System
Introduction
Multi-target co-sputtering system
Micro-spectro-sensor
A radio-frequency sputtering system has been developed to provide high-quality metal and ceramics thin-film deposition such as high dielectric BaSrTiO3, transparent conductive InZnO3 and UV anti-reflection coatings. The system, equipped an ion source, enables a surface modification and ion-assisted deposition that results in the improved thin-film properties. With a homemade patent micro-spectro-sensor, the sputtering achieves in-situ leakage detection and improves the industry's throughput and competitiveness.
Technology
- High-quality metal and function ceramic thin-film coatings
- Surface modification and ion-assisted deposition
- Development of high vacuum system and coater
- Technologies transfer of in-situ micro-spectro-sensor for the leakage detection
Specification
- Three 4" sputtering cathodes
- 1100 W radio-frequency power supply
- High energy ion source
- 800 °C substrate heating rotation manipulation
Application
- Semiconductor and optoelectronics related coating industry
- Vacuum system and thin film fabrication industry
