Pulsed Laser Deposition
Introduction
ITRC provides system integration to the potential customers. Pulsed laser deposition (PLD) process adopts focused high-power pulsed laser beam which is directed into a chamber and impacted onto a target. Absorbing the high energy, the target surface atoms will transform to high kinetic-energy plasma and then evaporate. Due to the non-equilibrium deposition, the material composition of thin films and target are almost the same, especially for multi-compounded materials or doped materials. The thickness of thin films can be precisely controlled by the laser counts. Hence, the thin films grown by PLD demonstrate excellent epitaxy characters.
Specifications
- The pulse width of Nd:YAG laser beam: ~ 10 ns
- The maximum power: 1 J/pulse
- Optional pulsed laser wavelength: 1064 nm, 532 nm, 355 nm and 266 nm
Technology and Applications
The illustration of PLD
- Multi-compounded material thin film process
- Super-lattice thin film process
- Nano- structure thin film process
- Magnetic thin films
- Ferroelectric thin films
- Superconductivity thin films
- Semiconductivity thin films
PLD system
2009/8/14 updated
