Pulsed Laser Deposition
Introduction
Pulsed laser deposition (PLD) process adopts focused high-power pulsed laser beam, which is directed into a chamber and impacted onto a target. The target surface absorbing the high energy will be transformed into high kinetic-energy plasma, and then evaporated. Due to the non-equilibrium deposition, the material composition of thin films and target are almost the same, especially for multi-compounded materials or doped materials. The thickness of thin films can be precisely controlled by the laser counts. Hence, the thin films grown by PLD demonstrate excellent epitaxy characters.
Technology
The illustration of PLD
- Multi-compounded material thin film process
- Super-lattice thin film process
- Nano- structure thin film process
Specification
- The pulse width of Nd:YAG laser beam: ~ 10 ns
- The maximum power: 1 J/pulse
- Optional pulsed laser wavelength: 1064 nm, 532 nm, 355 nm and 266 nm
Application
- Magnetic thin films
- Ferroelectric thin films
- Superconductivity thin films
- Semiconductivity thin films
The setup of PLD
