Precision Optical Thin-film Equipment & Process
Development of CMOS Image Sensor
High precision optical film evaporation system
Multispectral filter
Purpose
This system constructed for researches and develops five different wave bands (Multispectral filter, MSF) of CMOS image sensor. Consider the micron-scale gaps of MSF, the MSF position define by photoresist structure in photolithographic process. Consider the low temperature of System regulation, optical thin films deposited by the ion-assiated electron-beam evaporation technique to control the system temperature and add the kinetic energy for improve the quality of thin films.
Specifications & Features
Optical thin films deposited by the ion-assisted electron-beam evaporation technique, and control the thin film thickness accurately by high precision optical monitor system, and test thin film character in like aerospace environment, conforms thin film to ensue the aerospace quality.
- Ion-assisted deposition
- Wideband optical monitoring
- Optical Coating technology
- Thin film analysis
Applications
- VCDi (Vegetation and Change Detection imager) Band 1 – Band 9
- Optical coatings used in CMOS image sensor specification
Band pass filter
The optical bandpass for each spectral band (B1 to B4)
Contact
Hung-Pin Chen
E-mail: chbin@itrc.org.tw
