Equipment & Process Technolgoy for Nano/Micro Device
Nanosphere Lithography Technology
Purpose
Nanosphere lithography is one of the advanced process for nanostructures. It can easily make large-area periodic nanosphere arrays with self-organized polystyrene nanospheres. It has been developed various nanoparticles, carbon nanotube and nanostructure with deposited and lithography process.
Specifications & Features
Nanosphere lithography is a low cost and simple technique for large-area periodic nanoparticle arrays. Effects of the spin-coated speed, substrate temperature and clean method on the nanosphere arrays were been investigated.
- Nanosphere size: 200, 400, 600, 1000 and 2000 nm
- Nanoparticle arrays: Pt, Au, Ni, FePt, size: ~100 nm
- Nano-honeycombs: Fe2O3, NiO, ZnO, high: < 20 nm
Applications
- Optical device: photonic crystals, biosensor, non-linear optical device
- Nano device: electron filed emitter, carbon nanotube, flat panel display
- Magnetic device: pattern magnetic recording media
SEM image for the close-packed arrays of NiO nano-honeycombs
SEM image for the close-packed arrays of Fe2O3 nano-honeycombs
SEM image for the selected-area arrays of multilayer nanospheres
AFM image of FePt magnetic nanoparticle arrays
Contact
Chao-Te Lee
E-mail: tigerlee@itrc.org.tw
