Equipment & Process Technolgoy for Nano/Micro Device
Pulsed Laser Deposition
The illustration of PLD
Purpose
Pulsed Laser deposition fabrication adopts high-power pulsed laser beam, which focused by lens will be directed into chamber and hit the target. The target surface absorbing high energy will transform to high kinetic-energy plasma, and then evaporate. Due to the non-equilibrium deposition, the materials of thin films and target are almost the same, especially for multi-compounded materials or doped materials. The thickness of thin films can be precisely controlled to the laser pulse number. Hence, the thin films grown by Pulsed Laser Deposition demonstrate excellent epitaxy characters. These features make PLD a useful tool to fabricate materials with multilayer, superlattice, and nano structures.
Specifications & Features
- The pulse width of Nd:YAG Laser beam: ~ 10 ns
- Optional pulsed laser wavelength: 1064 nm, 532 nm, 355 nm, 266 nm
- The maximum power: ~ 1 J/pulse
Applications
- Magnetic thin films
- Ferroelectric thin films
- Super conductivity thin films
- Semi-conductivity thin films
The setup of PLD
Contact
Da-Ren Liu
E-mail: daren@itrc.org.tw
