Precision Optical Thin-film Equipment & Process
Development of New Type Transparent Conductive Oxide Films
A co-sputtering system. Insert shows Ion-beam assisted sputtering process.
Purpose
A co-sputtering system has established by ITRC to provide high-quality thin film deposition such as transparent conductive oxide (TCO) films. High conductive and high visible transparent TCO thin films, such as indium-tin-oxide (ITO), Zn-doped indium oxide (IZO) and Ga-, Al-doped zinc oxide (GZO, AZO) are developed to meet the optoelectronic properties of solar cells, OLEDs and LCDs. ITRC's sputtering technique could provide high-quality TCO films on plastic substrate for the flexible electronics.
Specifications & Features
A state-of-art low-temperature process was developed to deposit transparent conductive oxide films on the thermal sensitive plastic substrates. This sophificated sputtering system equipped with an ion source enables a surface modification and resulting a improved thin-film properties.
- Visible transparence > 85% (@400–700 nm)
- Sheet resistivity 40 – 300 Ω/☐
- Surface roughness (rms) < 1.4 nm
Applications
- Transparent conductive oxide films for LCDs application
- Flexible electronics application
- EMI/EMR shielding coating
- Anti-reflection coating
Topographies (AFM) and corresponding current images (CAFM) for IZO samples.
X'TEM images shows the microcrystalline IZO films on SiO2-coated PET substrate.
Current density – applied voltage – luminance characteristics of the flexible OLED
Contact
Han-chang Pan
E-mail: charlespan@itrc.org.tw
